polishing material

[ˈpɔliʃiŋ məˈtiəriəl]
  • 释义

    磨光材料;磨光剂;磨光物;光泽剂;

数据更新时间:2025-11-14 10:09:38
1、

Cinnabar is the main mineral material for polishing mercury.

丹砂是炼汞最主要的矿物原料.

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2、

However, the material can be improved, such as by cutting waste Zhukuai to fine polishing.

不过, 取材可以改良, 比如用废旧竹筷削细抛光即可.

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3、

The effects on material removal of MJP Jet Polishing by several parameters were given.

研究了磁射流抛光时几种工艺参数对材料去除的影响.

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4、

As a raw material in production of aluminous refractory, electric ceramic components, polishing and grinding products.

本品中用作高铝耐火材料, 电磁器件以及抛光研磨等制品中的原料.

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5、

Finally, discussed are etching mechanism, polishing principles, and control of reactive versions of the InP material.

文章最后讨论了InP材料的腐蚀机理 、 抛光原理及化学反应类型的控制.

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6、

Distribution of removed material in Fluid Jet Polishing ( FJP) was investigated in experiments. The characteristics of fluid velocity and pressure on the sample surface were simulated using Finite Element Method ( FEM) when the fluid jet impacts the work piece.

实验研究了液体喷射抛光技术的材料去除量分布特征,并利用有限元分析方法,分析了抛光头(液体柱)与工件表面相互作用时流场的分布特点。

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7、

Resin bonded silicon carbide grinding block during the grinding process, high grinding efficiency, good self sharpening abrasive tool, workpiece surface is not easy to burn and polishing performance and good processing properties, it can be widely applied in the field of material surface processing.

树脂结合剂碳化硅磨块在磨削过程中磨削效率高、磨具自锐性好、被加工工件表面不容易烧伤和抛光性能好等加工特性,因此在材料表面加工领域得以广泛应用。

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8、

Characteristics of the polishing area are investigated by fluid jet polishing ( FJP) and removal mechanism of material in the experiment.

从实验出发,研究了液体喷射抛光中抛光区的特征及材料的去除机理。

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